基于285nm二氧化硅基底的单层氮化硼薄膜
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- 公司名称 上海巨纳科技有限公司
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- 更新时间 2020/12/26 13:50:12
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参考价 | 面议 |
联系方式:袁经理 13761090949 查看联系方式
联系我们时请说明是仪器网上看到的信息,谢谢!
Single Layer CVD hexagonal Boron Nitride Film on 285 nm SiO2/Si substrates (p-doped), 1cmx1cm: 8 packProperties of BN film97% coverage with minor holes and organic residuesHigh Crystalline Quality
Single Layer CVD hexagonal Boron Nitride Film on 285 nm SiO2/Si substrates (p-doped), 1cmx1cm: 8 pack
Properties of BN film
97% coverage with minor holes and organic residues
High Crystalline Quality
The Raman spectrum should peak at ~1369cm-1
Single Layer CVD hexagonal Boron Nitride Film on 285 nm SiO2/Si substrates (p-doped), 1cmx1cm: 8 pack
Properties of BN film
97% coverage with minor holes and organic residues
High Crystalline Quality
The Raman spectrum should peak at ~1369cm-1
Single Layer CVD hexagonal Boron Nitride Film on 285 nm SiO2/Si substrates (p-doped), 1cmx1cm: 8 pack
Properties of BN film
97% coverage with minor holes and organic residues
High Crystalline Quality
The Raman spectrum should peak at ~1369cm-1
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