Retrofit CDSEM S-9380 执行原厂新机器同样验收技术指标：
提供样品测试验证；
General
Wafer size : 8-inch (200-mm size)
V-notch wafer of SEMI or JEIDA standards is applicable.
CD measurement principle : Cursor and line profile measurement
CD measurement range : 0.05 to 2.0 mm (either line width or hole diameter)
CD measurement reproducibility : ±1% or 0.6 nm (3 sigma), whichever larger
Throughput : due to the data after modification from Hitachi High-Technologies Corporation
Secondary electron image resolution
: 2 nm (at accelerating voltage of 0.8 kV; with
Hitachi’s reference specimen for resolution measurement)
Magnification : SEM image - 1,000´to 300,000´
Optical microscope image - approximay 110x (220x is optional)
升级：实验室数据上传接口；
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